大拱桥--暨南大学学生门户 » 图书馆 » 一般性问题(分类号：TN30)(共236本)

Active and passive thin film devices

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索取号：TN304.055/E801
作者：
出版社：London ; New York : Academic Press, 1978.

Thin films : interdiffusion and reactions

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索取号：TN304.055/E802
作者：
出版社：New York : Wiley, 1978.

Insulating films on semiconductors : proceedings of the second international conference, INFOS 81, Erlangen, Fed. Rep. of Germany, April 27-29, 1981

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索取号：TN304.055-53/E901/1981
作者：INFOS 81 (1981 : Erlangen、 Germany)、Schulz、 M. (Max)、Pensl、 G. (Gerhard)、
出版社：Berlin ; New York : Springer-Verlag, 1981.

Gallium arsenide

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索取号：TN304.2/E901
作者：
出版社：New York : American Institute of Physics, 1987.

MOS device and circuit design

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索取号：TN304.21/E901
作者：McCarthy、 Oliver J.、
出版社：Chichester ; New York : Wiley, 1982.

Electronic processes in non-crystalline materials

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索取号：TN304.8/E801.2
作者：Mott、 N. F. (Nevill Francis)、 Sir、 1905-、Davis、 E. A. (Edward Arthur)、 1936- joint author.、
出版社：Oxford : Clarendon Press ; New York : Oxford University Press, 1979.

Physics of electronic ceramics

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索取号：TN304.82/E801/1
作者：Electronic Phenomena in Ceramics Conference (1969 : University of Florida)、Hench、 L. L.、 ed.、Dove、 D. B.、 1932- ed.、United States. Air Force Materials Laboratory、 Dayton Ohio. Electromagnetic Materials Branch.、United States. Army Research Office、 Durham、 N.C. Metallurgy and Ceramics Division.、Florida. University、 Gainesville. Dept. of Metallurgical and Materials Engineering.、
出版社：New York, M. Dekker, 1971-72.

Physics of electronic ceramics

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索取号：TN304.82/E801/2
作者：Electronic Phenomena in Ceramics Conference (1969 : University of Florida)、Hench、 L. L.、 ed.、Dove、 D. B.、 1932- ed.、United States. Air Force Materials Laboratory、 Dayton Ohio. Electromagnetic Materials Branch.、United States. Army Research Office、 Durham、 N.C. Metallurgy and Ceramics Division.、Florida. University、 Gainesville. Dept. of Metallurgical and Materials Engineering.、
出版社：New York, M. Dekker, 1971-72.

Plasma etching in semiconductor fabrication

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索取号：TN305/E901
作者：Morgan、 Russ A.、 1950-、
出版社：Amsterdam ; New York : Elsevier, 1985.

Fundamentals of semiconductor devices

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索取号：TN305/E801
作者：Yang、 Edward S.、
出版社：London New York : McGraw-Hill, 1978.

Ion implantation

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索取号：TN305.2/E801
作者：International Conference on Ion Implantation in Semiconductors、 1st、 Thousand Oaks、 Calif.、 1970.、Eisen、 Fred H.、 ed.、Chadderton、 Lewis T.、 ed.、
出版社：London, New York, Gordon and Breach Science Publishers [1971]

Ion implantation

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索取号：TN305.3/E803
作者：
出版社：London Amsterdam, North-Holland Pub. Co.; New York, American Elsevier, 1973.

Ion implantation, sputtering and their applications

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索取号：TN305.3/E802
作者：Townsend、 P. D. (Peter David)、Kelly、 J. C. (John Clive)、 joint author.、Hartley、 N. E. W.、 joint author.、
出版社：London ; New York : Academic Press, 1976.

Impurity doping processes in silicon

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索取号：TN305.3/E901
作者：
出版社：Amsterdam ; New York : North-Holland Pub. Co. ; New York, N.Y. : Sole distributors for the USA and Canada, Elsevier North-Holland, 1981.

Ion implantation in semiconductors : science and technology : [proceedings of the fourth International Conference on Ion Implantation in Semiconductors and Other Materials, held at the Osaka Chamber of Commerce and Industry, August 1974]

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索取号：TN305.3-53/E801/4
作者：International Conference on Ion Implantation in Semiconductors and Other Materials (4th : 1974 : Osaka)、Namba、 Susumu、 1928-、
出版社：New York : Plenum Press, [1975]

Ion Implantation in semiconductors, 1976

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索取号：TN305.3-53/E801/5
作者：International Conference on Ion Implantation in Semiconductors and Other Materials (5th : 1976 : Boulder、 Colo.)、Chernow、 Fred.、Borders、 James A.、Brice、 David K.、
出版社：New York : Plenum Press, c1977.